NOVEL MASK DESIGN FOR MULTIWAVELENGTH DAYGLOW PHOTOMETRY

Authors
SRIDHARAN R NARAYANAN R MODI NK RAJU DP
Citation
R. Sridharan et al., NOVEL MASK DESIGN FOR MULTIWAVELENGTH DAYGLOW PHOTOMETRY, Applied optics, 32(22), 1993, pp. 4178-4180
Citations number
4
Categorie Soggetti
Optics
Journal title
Applied optics → ACNP
ISSN journal
00036935
Volume
32
Issue
22
Year of publication
1993
Pages
4178 - 4180
Database
ISI
SICI code
0003-6935(1993)32:22<4178:NMDFMD>2.0.ZU;2-V
Abstract
We present and discuss a novel mask design that provides multiwaveleng th measurement capability for the dayglow photometer.