ELECTROABSORPTION AND SATURATION BEHAVIOR OF INGAASP INP/INALAS MULTIPLE SUPERLATTICE ELECTRON-TRANSFER OPTICAL MODULATOR STRUCTURES/

Citation
N. Agrawal et al., ELECTROABSORPTION AND SATURATION BEHAVIOR OF INGAASP INP/INALAS MULTIPLE SUPERLATTICE ELECTRON-TRANSFER OPTICAL MODULATOR STRUCTURES/, Applied physics letters, 63(8), 1993, pp. 1110-1112
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
63
Issue
8
Year of publication
1993
Pages
1110 - 1112
Database
ISI
SICI code
0003-6951(1993)63:8<1110:EASBOI>2.0.ZU;2-7
Abstract
We report substantial progress in the growth of multi-quantum-well ele ctron transfer optical modulator structures by metalorganic vapor phas e epitaxy, which is made possible as a consequence of the highly abrup t modulation doping of donors and acceptors in InP-reservoir and InAlA s-barrier layers, respectively. Due to a large thermionic emission bar rier provided by the type II InP/InAlAs interface, the InGaAsP/InP/InA lAs devices exhibit extremely low leakage current densities. We observ e distinct and sharp features related to absorption quenching in diffe rential transmission spectroscopy. Moreover, the saturation intensitie s of electron transfer modulators are determined. The underlying physi cal mechanism is discussed.