CROSSED FLUXES TECHNIQUE FOR PULSED-LASER DEPOSITION OF SMOOTH YBA2CU3O7-X FILMS AND MULTILAYERS

Citation
Md. Strikovsky et al., CROSSED FLUXES TECHNIQUE FOR PULSED-LASER DEPOSITION OF SMOOTH YBA2CU3O7-X FILMS AND MULTILAYERS, Applied physics letters, 63(8), 1993, pp. 1146-1148
Citations number
21
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
63
Issue
8
Year of publication
1993
Pages
1146 - 1148
Database
ISI
SICI code
0003-6951(1993)63:8<1146:CFTFPD>2.0.ZU;2-H
Abstract
A system with two interacting plasma fluxes for the deposition of high -temperature superconductor films is presented. This system prevents t he appearance of particles on a film surface, and permits one to obtai n YBa2Cu3O7-x films with the surface defect concentration as low as 10 (4) cm-2, a high critical temperature of 90 K, and a critical current density of 4X10(6) A/cm2 at 77 K. It is shown that high morphological quality films are obtained at a specific target-substrate distance.