A SiGe-base heterojunction bipolar transistor with an extremely thin n
+ hydrogenated amorphous Si (alpha-Si:H) emitter is proposed and chara
cterized. The structure results in enhanced emitter injection efficien
cy, current gain, and frequency performance. The fabricated devices ex
hibited maximum current gains of 100 and Early voltages of 55 V. The u
nity current gain cutoff frequency (f(T)) for a device with an emitter
size of 2 X 4 mum2 was found to be 8.5 GHz.