CRACKING AND DELAMINATION OF METAL-ORGANIC VAPOR-DEPOSITED ALUMINA AND SILICA FILMS

Citation
Vac. Haanappel et al., CRACKING AND DELAMINATION OF METAL-ORGANIC VAPOR-DEPOSITED ALUMINA AND SILICA FILMS, Materials science & engineering. A, Structural materials: properties, microstructure and processing, 167(1-2), 1993, pp. 179-185
Citations number
21
Categorie Soggetti
Material Science
ISSN journal
09215093
Volume
167
Issue
1-2
Year of publication
1993
Pages
179 - 185
Database
ISI
SICI code
0921-5093(1993)167:1-2<179:CADOMV>2.0.ZU;2-K
Abstract
Amorphous alumina and silica films were deposited on AISI 304 by therm al decomposition at atmospheric pressure of aluminium-tri-sec-butoxide and di-acetoxy-di-tertiary-butoxide-silane respectively. Above a crit ical coating thickness of the oxide films, cracking and delamination o ccurred during the deposition process. These were due to intrinsic rat her than to thermal stresses. Cracking and delamination do not occur s imultaneously. The fracture toughness of the film, the substrate and t he interface is an important factor. After delamination along the subs trate-film interface, the films curled to scrolls, indicating stress. A complete explanation of the stress gradient formed in the film durin g the deposition process is not yet available.