PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF ZRF4-BASED FLUORIDE GLASSES

Authors
FUJIURA K NISHIDA Y SATO H SUGAWARA S KOBAYASHI K TERUNUMA Y TAKAHASHI S
Citation
K. Fujiura et al., PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF ZRF4-BASED FLUORIDE GLASSES, Journal of non-crystalline solids, 161, 1993, pp. 14-17
Citations number
7
Categorie Soggetti
Material Science, Ceramics
Journal title
Journal of non-crystalline solids → ACNP
ISSN journal
00223093
Volume
161
Year of publication
1993
Pages
14 - 17
Database
ISI
SICI code
0022-3093(1993)161:<14:PCOZFG>2.0.ZU;2-A
Abstract
A ZBLAN (ZrF4-BaF2-LaF3-AlF3-NaF) glass film is synthesized for the fi rst time on the inner surface of a ZBLYAN (ZrF4-BaF2-LaF3-YF3-AlF3-NaF ) support tube. The maximum deposition rate is about 60 mum/h. The com position of the ZBLAN-glass film is controlled with the vaporizing tem peratures of the starting materials, but compositional distribution is observed along the preform axis. The thermal properties of the synthe sized glass film are nearly the same as those of ZBLAN glass synthesiz ed by the conventional melt-casting method.