AN ALL-ROUND PERFORMER IN THE PHYSICAL VAPOR-DEPOSITION LABORATORY

Physical vapour deposition (PVD) technology is enjoying an ever-expand ing range of applications. New materials are being developed. Process technology is being better understood. The HTC 625 Multilab PVD coater goes a long way toward meeting the needs that arise out of these deve lopments. Universal cathodes, Steered Arc(TM)-unbalanced-magnetron cap ability, ABS(TM) technology and high frequency bias are standard featu res. Today this unit can produce coatings from materials such as TiN, TiCN, ZrN, TiAlN, TiZrN, TiNbN and hydrogenated amorphous carbon.