DEMONSTRATION OF Y1BA2CU3O7-DELTA AND COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR DEVICE FABRICATION ON THE SAME SAPPHIRE SUBSTRATE

Citation
Mj. Burns et al., DEMONSTRATION OF Y1BA2CU3O7-DELTA AND COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR DEVICE FABRICATION ON THE SAME SAPPHIRE SUBSTRATE, Applied physics letters, 63(9), 1993, pp. 1282-1284
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
63
Issue
9
Year of publication
1993
Pages
1282 - 1284
Database
ISI
SICI code
0003-6951(1993)63:9<1282:DOYACM>2.0.ZU;2-A
Abstract
We report the first fabrication of active semiconductor and high-tempe rature superconducting devices on the same substrate. Test structures of complementary metal-oxide-semiconductor transistors were fabricated on the same sapphire substrate as test structures of Y1Ba2Cu3O7-delta flux-flow transistors, and separately, Y1Ba2Cu3O7-delta superconducti ng quantum interference devices utilizing both biepitaxial and step-ed ge Josephson junctions. Both semiconductor and superconductor devices were operated at 77 K. The cofabrication of devices using these dispar ate yet complementary electronic technologies on the same substrate op ens the door for the fabrication of true semiconductive/superconductiv e hybrid integrated circuits capable of exploiting the best features o f each of these technologies.