SYNTHESIS OF X-RAY-INTENSITY PROFILES FOR X-RAY OPTICAL-SYSTEMS WITH CURVED DIFFRACTORS

A procedure for synthesizing the x-ray intensity profile for x-ray opt ical systems employing curved diffractors is presented. The synthesis takes account of the effects of misalignment, the solid angle, and the convergence or divergence of the diffracted x rays. Broadening effect s due to finite source size, wavelength spread, and presence of polych romatic radiation have also been included. The broadening effects on t he intensity profile are demonstrated analytically. By comparing exper imental results with results from the synthesis method, curved diffrac tor's parameters (rocking curve width and peak reflectivity) were quan titatively evaluated for mica, silicon, graphite, and LiF crystals at three x-ray wavelengths.