Yh. Phang et al., X-RAY-DIFFRACTION MEASUREMENT OF PARTIALLY CORRELATED INTERFACIAL ROUGHNESS IN MULTILAYERS, Journal of applied physics, 74(5), 1993, pp. 3181-3188
The existence of partially correlated roughness in multilayer thin fil
ms is demonstrated using x-ray diffraction diffuse-intensity distribut
ion measurements. The method is generally applicable and produces, in
addition to values of magnitudes of interfacial roughness and its late
ral correlation length, a measure of the cross correlation between int
erfaces separated by intermediate ones. A simple phenomenological mode
l can describe roughness in W/C multilayers prepared under standard co
nditions. A cumulative roughness function is used to show that the wav
elength range in which the interfacial roughness predominates in these
layers lies between 50 angstrom and 2000 angstrom and that the long-w
avelength roughness replicates better than the short-wavelength roughn
ess.