NANOSIZED FCC THALLIUM INCLUSIONS IN ALUMINUM

Citation
E. Johnson et al., NANOSIZED FCC THALLIUM INCLUSIONS IN ALUMINUM, Philosophical magazine letters, 68(3), 1993, pp. 131-135
Citations number
20
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
09500839
Volume
68
Issue
3
Year of publication
1993
Pages
131 - 135
Database
ISI
SICI code
0950-0839(1993)68:3<131:NFTIIA>2.0.ZU;2-I
Abstract
Ion implantation of pure aluminium with thallium induces the formation of nanosized crystalline inclusions of thallium with a f.c.c. structu re. The size of the inclusions depends on the implantation conditions and subsequent annealing treatments, and is typically in the range fro m 1 to 10 nm. The inclusions are aligned topotactically with the alumi nium matrix with a cube-cube orientation relationship, and they have a truncated octahedral shape bounded by {111} and {001} planes. The lat tice parameter of the f.c.c. thallium inclusions is 0.484+/-0.002 nm, which is slightly but significantly larger than in the high-pressure f .c.c. thallium phase known to be stable above 3.8 GPa.