ASYMPTOTIC SOLUTION FOR NONLINEAR CHEMICAL-VAPOR-DEPOSITION PROBLEMS

The problem of chemical vapor deposition involving reaction kinetics o f any order n at a heated substrate is considered. The deposition proc ess is then described by a convective diffusion equation, coupled to n onlinear boundary conditions, describing the chemical reaction taking place at the heated substrate, where the nonlinearity is given in term s of the order n of the reaction kinetics. We derive boundary layer eq uations and use a combination of perturbation and similarity methods t o find the deposition rate along the susceptor.