INFLUENCE OF SUBSTRATE-TEMPERATURE ON THE FORMATION OF CARBON-FILMS BY HYBRID PLASMA CVD

Influence of the substrate temperature on the formation of carbon film s by hybrid plasma CVD is discussed. The carbon film deposited on a mo lybdenum substrate at 120-570-degrees-C was amorphous and showed appre ciable sp3 bonds in the infrared absorption spectra. Typical Raman spe ctra of films deposited on Mo substrate at three different substrate t emperatures were studied. The Raman spectra exhibit three (substrate t emperature dependent) features: (1) two broad peaks at 1300 and 1600 c m-1 at 120-degrees-C, (2) two broad peaks at 1339 and 1580 cm-1 at 430 -degrees-C, and (3) two sharp peaks at 1351 cm -1 and 1585-1581 cm-1 a t above 600-degrees-C. By heating the substrate to 600-degrees-C, the films had higher mechanical and electrical characteristics (dynamic-ha rdness: 400, sheet resistance: 10(7) OMEGA/CM2). The deposition rate o f the films increased with increase in substrate temperature above 430 -degrees-C.