ELECTROCHEMICAL-BEHAVIOR OF NIOBIUM AND NIOBIUM PASSIVE FILMS IN NITRIC-ACID SOLUTIONS

Citation
Wa. Badawy et Fm. Alkharafi, ELECTROCHEMICAL-BEHAVIOR OF NIOBIUM AND NIOBIUM PASSIVE FILMS IN NITRIC-ACID SOLUTIONS, INDIAN JOURNAL OF CHEMICAL TECHNOLOGY, 4(2), 1997, pp. 94-100
Citations number
23
Categorie Soggetti
Chemistry Applied","Engineering, Chemical
ISSN journal
0971457X
Volume
4
Issue
2
Year of publication
1997
Pages
94 - 100
Database
ISI
SICI code
0971-457X(1997)4:2<94:EONANP>2.0.ZU;2-G
Abstract
Electrochemical behaviour of bare niobium and-phosphoric acid anodized niobium electrodes is investigated in nitric acid solutions. Electroc hemical impedance spectroscopy and polarisation techniques have been u sed to investigate the open-circuit growth of the passive film. The st ability of the anodic oxide film has been studied as a function of the formation voltage, formation current density and concentration of the ambient electrolyte. The results show that the Nb-Nb2O5-1M HNO3 does not behave as a perfect dielectric. The flat band potential and donor concentration of the semiconducting anodic oxide film have been calcul ated from the Mott-Schottky plots.