M. Yanagihara et al., STABILITY OF SPUTTERED MO BN, W/BN, MO/B4C, AND W/B4C SOFT-X-RAY MULTILAYERS UNDER EXPOSURE TO MULTIPOLE-WIGGLER RADIATION/, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 334(2-3), 1993, pp. 638-642
The effect of white wiggler radiation exposure on Mo/BN, W/BN, Mo/B4C,
and W/B4C multilayers was evaluated by comparing Soft X-Tay reflectan
ce. All samples were prepared by magnetron sputtering onto SiC substra
tes. The choice of combinations was based upon thermal annealing tests
for Mo/X and W/X (X = C, Si, BN, and B4C) multilayers, prior to any e
xposure tests. On exposure under radiation power density of approximat
ely 2.3 W/mm2 for ten minutes the Mo/BN and W/BN samples underwent app
roximately 20% and approximately 65% degradation in reflectance, while
the Mo/B4C and W/B4C samples were almost destroyed. Of the four sampl
es the Mo/BN multilayer was the most stable. The result was qualitativ
ely consistent with that of the anneal tests.