STABILITY OF SPUTTERED MO BN, W/BN, MO/B4C, AND W/B4C SOFT-X-RAY MULTILAYERS UNDER EXPOSURE TO MULTIPOLE-WIGGLER RADIATION/

Citation
M. Yanagihara et al., STABILITY OF SPUTTERED MO BN, W/BN, MO/B4C, AND W/B4C SOFT-X-RAY MULTILAYERS UNDER EXPOSURE TO MULTIPOLE-WIGGLER RADIATION/, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 334(2-3), 1993, pp. 638-642
Citations number
16
Categorie Soggetti
Nuclear Sciences & Tecnology","Physics, Particles & Fields","Instument & Instrumentation",Spectroscopy
ISSN journal
01689002
Volume
334
Issue
2-3
Year of publication
1993
Pages
638 - 642
Database
ISI
SICI code
0168-9002(1993)334:2-3<638:SOSMBW>2.0.ZU;2-B
Abstract
The effect of white wiggler radiation exposure on Mo/BN, W/BN, Mo/B4C, and W/B4C multilayers was evaluated by comparing Soft X-Tay reflectan ce. All samples were prepared by magnetron sputtering onto SiC substra tes. The choice of combinations was based upon thermal annealing tests for Mo/X and W/X (X = C, Si, BN, and B4C) multilayers, prior to any e xposure tests. On exposure under radiation power density of approximat ely 2.3 W/mm2 for ten minutes the Mo/BN and W/BN samples underwent app roximately 20% and approximately 65% degradation in reflectance, while the Mo/B4C and W/B4C samples were almost destroyed. Of the four sampl es the Mo/BN multilayer was the most stable. The result was qualitativ ely consistent with that of the anneal tests.