Mp. Bernstein et Db. Collum, SOLVENT-DEPENDENT AND SUBSTRATE-DEPENDENT RATES OF IMINE METALATIONS BY LITHIUM DIISOPROPYLAMIDE - UNDERSTANDING THE MECHANISMS UNDERLYING K(REL), Journal of the American Chemical Society, 115(18), 1993, pp. 8008-8018
Rate studies of the metalation of imines derived from cyclohexanone an
d 2-methylcyclohexanone with lithium diisopropylamide (LDA) in tetrahy
drofuran (THF), N,N,N',N'-tetramethylethylenediamine (TMEDA), and dime
thylethylamine (DMEA) mixtures are described. The N-isopropylimines ap
pear to metalate via a mechanism involving deaggregation of the LDA di
mer to give reactive monomers without participation of additional dono
r solvent. TMEDA functions as an eta1 ligand in both the starting LDA
dimer and the rate-determining monomeric transition state as evidenced
by analogous behavior with DMEA. Comparisons of the N-isopropylimine
metalations with previously described rate studies of the isostructura
l N,N-dimethylhydrazones provide no evidence that a Me2N-Li interactio
n facilitates the metalation. Metalation of imines bearing pendant Me2
N moieties on the N-isopropyl groups appears to proceed by either of t
wo mechanisms. In THF and THF/hexane mixtures, the monomer-based pathw
ay completely dominates; a Me2N-Li interaction does not appear to be i
mportant. In TMEDA/hexane mixtures and DMEA/hexane mixtures, dramatic
rate accelerations are observed. Accompanying substantial changes in t
he mathematical forms of the rate equations suggest that the metalatio
ns proceed by double dissociation of R3N ligands with subsequent rate-
limiting metalation by the solvent-free LDA dimer. Open dimers of LDA
are suggested to be the critical reactive intermediates in a mechanism
shown to constitute a complex-induced proximity effect (CIPE).