K-SHELL AUGER TRANSITIONS INDUCED BY MO X-RAYS

Citation
L. Kover et al., K-SHELL AUGER TRANSITIONS INDUCED BY MO X-RAYS, Surface and interface analysis, 20(8), 1993, pp. 659-665
Citations number
18
Categorie Soggetti
Chemistry Physical
ISSN journal
01422421
Volume
20
Issue
8
Year of publication
1993
Pages
659 - 665
Database
ISI
SICI code
0142-2421(1993)20:8<659:KATIBM>2.0.ZU;2-V
Abstract
For exciting K-Auger transitions of elements with atomic number betwee n 13 and 26, Mo x-rays (Mo bremsstrahlung + Mo L(alpha, beta) from a h igh voltage (max. 30 kV) source were used. High-resolution K-Auger spe ctra were measured by the help of a high luminosity hemispherical elec tron spectrometer. Spectral intensities obtained using the Mo x-ray so urce are compared to the respective intensities measured using an Al a node and source parameters usual for electron spectrometers. The attai nable gain in Auger yields is between 2 and 15 for most elements inves tigated and reaches a factor of 20.5 in the case of P KLL. Optimum con ditions of K-Auger excitation (regarding the atomic number region ment ioned) are also discussed. As an example for applications, the phospho rus K-Auger parameter has been determined for GaP, taking an advantage of the presence of the P Is (Mo Lalpha) photoelectron line in the spe ctra excited by Mo x-rays. The higher analytical sensitivity, attainab le by measuring Mo x-ray-induced P KLL Auger electrons compared to the sensitivity of the conventional XPS (Al Kalpha excited P 2p), is demo nstrated in the case of a phosphoric compound (corrosion inhibitor) ad sorbed on a polycrystalline Fe surface.