RADIATION-DAMAGE BEHAVIOR OF LINBO3 CRYSTAL BY MEV-F ION-IMPLANTATION

X, Y, and Z crystalline cut LiNbO3 crystals were implanted by 1.0 MeV F ions with a dose of 1 x 10(15) ions/cm2. The virgin and implanted Li NbO3 crystals were investigated using the Rutherford backscattering/ch anneling technique. The obtained minimum yields of virgin crystals wer e 4%, 8%, and 6% for X-, Y-, and Z-cut LiNbO3 crystals, respectively, because of their different arrangements of lattice sites in channeling direction. The measured damage profiles are also influenced by the ar rangement of lattice sites in channeling measurements. The damage prof iles of X-cut LiNbO3 crystal induced by 1.0 MeV F+ at a fluence range of 1 x 10(14)-3 x 10(15) ions/cm2 have been studied and compared with the Transport of Ions in Matter, version 1990 calculation. It has been found that not only the nuclear energy deposition but also the electr onic energy deposition influences the defect production.