E. Kondoh et al., HOMOEPITAXIAL GROWTH OF DIAMOND BY AN ADVANCED HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION METHOD, Journal of applied physics, 74(3), 1993, pp. 2030-2035
Homoepitaxial (111), (110), and (100) diamond films were grown by an a
dvanced hot-filament chemical vapor deposition method that enables acc
urate control of the substrate temperature independently of the other
chemical vapor deposition parameters. The obtained films were examined
mainly by optical microscopy and reflection high energy electron diff
raction (RHEED). The surface morphology of the films depended on the d
eposition pressure, methane concentration in the feed gas, and substra
te temperature. Very streaky RHEED patterns, indicative of atomically
smooth surfaces, were obtained from the samples deposited on the (111)
substrates at a pressure of 100-500 Torr and methane concentration of
0.5%, and also from the samples deposited on the (100) substrates at
300-500 Torr and 1%-2%. These conditions, which we call ''window'' con
ditions, are remarkable, since such deposition pressures as 100-500 To
rr are much higher than the few tens of Torr normally required for pol
ycrystalline growth. However, the films on the (110) substrates exhibi
ted spotty patterns due to three-dimensional growth, although optical
microscopically smoothness was achieved by the 500 Torr and 0.5% depos
ition. Regarding the pressure effects, a reduction of H radicals and c
oncurrent increase of the C2Hx(x = 1-2) species are characteristic of
the gas-phase chemistry under these window conditions. We speculate th
at the success of epitaxial deposition under these window conditions w
as due to surface reconstruction arising from the lack of H radicals a
nd/or from the surface reactions in which C2Hx mediates.