HOMOJUNCTION DIODE OF CUINSE2 THIN-FILM FABRICATED BY NITROGEN IMPLANTATION

Citation
M. Nishitani et al., HOMOJUNCTION DIODE OF CUINSE2 THIN-FILM FABRICATED BY NITROGEN IMPLANTATION, Journal of applied physics, 74(3), 1993, pp. 2067-2070
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
74
Issue
3
Year of publication
1993
Pages
2067 - 2070
Database
ISI
SICI code
0021-8979(1993)74:3<2067:HDOCTF>2.0.ZU;2-T
Abstract
Rectifying homojunction have been fabricated in polycrystalline CuInSe 2 thin film. The p-n junction diode was obtained by short annealing in nitrogen atmosphere at 450-degrees-C following the ion implantation o f nitrogen with the energy and the dose of 50 keV and 1 x 10(15) cm-2, respectively. The properties of the near surface region in the films implanted have been studied by the Raman scattering spectroscopy. The secondary ion mass spectroscopy depth profile of the nitrogens in the CuInSe2 film and the capacitive-voltage characteristics of the rectify ing diode have been measured to characterize the junction properties. The photovoltaic characteristics in AM 1.0, 100 mW/cm2 are shown with the efficiency of 0.35%.