The BaTiO3 ferroelectric films of quality suitable for applying as die
lectrics in 64 and 256 Mb dynamic random access memory have been succe
ssfully synthesized using the laser ablation technique. The dielectric
constant and dielectric strength of the films are epsilon = 200 and 1
MV/cm, respectively. The switching characteristics are Q(c)=0.66 muc/
cm2, t(s)=0.1 ps, and J1=1.57 muA/cm2 at 2.5 V, for charge storage den
sity, writing time, and leakage current density, respectively. The qua
lity of the BaTiO3 films is Superior to the Ta2O5 dielectric films and
is comparable to the lead-zirconate-titanate ferroelectric films.