FINITE-SIZE-SCALING BEHAVIOR OF FERROMAGNETIC THIN-FILMS

Citation
F. Huang et al., FINITE-SIZE-SCALING BEHAVIOR OF FERROMAGNETIC THIN-FILMS, Journal of applied physics, 73(10), 1993, pp. 6760-6762
Citations number
33
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
73
Issue
10
Year of publication
1993
Part
2B
Pages
6760 - 6762
Database
ISI
SICI code
0021-8979(1993)73:10<6760:FBOFT>2.0.ZU;2-X
Abstract
We have used molecular-beam epitaxy to grow high-quality pseudomorphic Ni and Co1Ni9 films on Cu(001). From temperature-dependent surface ma gneto-optic Kerr effect measurements of these films, we have determine d the finite-size scaling behavior of the Curie temperature of ultrath in films for a thickness range of n=2.5-16 monolayers (ML). The film t hickness dependent Curie temperature for each of these ferromagnetic t hin-film systems, T(C)(n), is described by a finite-size scaling formu la: [T(C)(infinity) - Tc(n)]/T(C)(n) = [(n - n')/n0]-1/nu, where T(C)( infinity) is the bulk Curie temperature, n0 = 2.5 +/- 0. 5 ML for Co f ilms and 3.5 +/- 0.4 ML for Ni and Co1Ni9 films is the microscopic len gth scale, and v=0.76 +/- 0.08 is the bulk correlation length exponent . An interesting result is that Tc(n) extrapolates to zero in the sing le mononolayer limit, n' = 1.