We have used magnetron sputtering to deposit Co/Pd-Ag multilayers onto
unheated (111) Si substrates. The influence of Ag concentration on th
eir structure, coercivity, and hysteresis loop squareness was studied.
The best rectangular characteristics and highest coercivity were obta
ined for the films with 4.0 at. % Ag. These multilayers indicate consi
derable improvement in the magnetic properties necessary for magneto-o
ptic recording media compared with Co/Pd films. The role of tensile st
ress in the system is pointed out and discussed.