Jh. Zhao et al., ADMITTANCE SPECTROSCOPY CHARACTERIZATION OF INP INGAASP SINGLE QUANTUM-WELLS GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION/, Applied physics letters, 62(22), 1993, pp. 2810-2812
A set of sulfur-doped low pressure metalorganic vapor phase epitaxy In
P/InGaAsP single quantum wells have been studied by admittance spectro
scopy and a variety of other techniques. Admittance spectroscopy allow
s the studies of carrier emission from both the sulfur shallow impurit
y state and a quantum well which is seen to behave like a giant trap.
The electron emission rates will be reported and the sulfur shallow im
purity level is found to be 10 meV, in agreement with a simple theoret
ical calculation.