ADMITTANCE SPECTROSCOPY CHARACTERIZATION OF INP INGAASP SINGLE QUANTUM-WELLS GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION/

Citation
Jh. Zhao et al., ADMITTANCE SPECTROSCOPY CHARACTERIZATION OF INP INGAASP SINGLE QUANTUM-WELLS GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION/, Applied physics letters, 62(22), 1993, pp. 2810-2812
Citations number
6
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
62
Issue
22
Year of publication
1993
Pages
2810 - 2812
Database
ISI
SICI code
0003-6951(1993)62:22<2810:ASCOII>2.0.ZU;2-3
Abstract
A set of sulfur-doped low pressure metalorganic vapor phase epitaxy In P/InGaAsP single quantum wells have been studied by admittance spectro scopy and a variety of other techniques. Admittance spectroscopy allow s the studies of carrier emission from both the sulfur shallow impurit y state and a quantum well which is seen to behave like a giant trap. The electron emission rates will be reported and the sulfur shallow im purity level is found to be 10 meV, in agreement with a simple theoret ical calculation.