DETERMINATION OF THE LAYER STRUCTURE OF EMBEDDED STRAINED INGAAS MULTIPLE-QUANTUM WELLS BY HIGH-RESOLUTION X-RAY-DIFFRACTION

Citation
Wy. Choi et Cg. Fonstad, DETERMINATION OF THE LAYER STRUCTURE OF EMBEDDED STRAINED INGAAS MULTIPLE-QUANTUM WELLS BY HIGH-RESOLUTION X-RAY-DIFFRACTION, Applied physics letters, 62(22), 1993, pp. 2815-2817
Citations number
5
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
62
Issue
22
Year of publication
1993
Pages
2815 - 2817
Database
ISI
SICI code
0003-6951(1993)62:22<2815:DOTLSO>2.0.ZU;2-8
Abstract
High resolution x-ray diffraction (HRXRD) has been used to determine t he layer compositions and thicknesses of compressively strained InGaAs multiple-quantum-well (MQW) structures embedded in thick cladding lay ers that are nominally lattice matched to InP. The entire layer struct ure was accurately determined from the results of HRXRD measurements f or a simple strained MQW structure in which barriers and claddings are of the same composition. The estimated margins of error are less than 1 % for the quantum-well indium composition and +/-2.5 angstrom for w ell and barrier thicknesses. The layer structure of the active region in a complete InGaAlAs graded-index separate confinement strained MQW laser diode has also been determined by HRXRD.