CHARACTERIZATION AND THERMAL-PROPERTIES EVALUATION OF THIN-FILMS, WAFERS AND SUBSTRATES

Authors
Citation
Rp. Tye et A. Maesono, CHARACTERIZATION AND THERMAL-PROPERTIES EVALUATION OF THIN-FILMS, WAFERS AND SUBSTRATES, Thermochimica acta, 218, 1993, pp. 155-172
Citations number
18
Categorie Soggetti
Chemistry Analytical
Journal title
ISSN journal
00406031
Volume
218
Year of publication
1993
Pages
155 - 172
Database
ISI
SICI code
0040-6031(1993)218:<155:CATEOT>2.0.ZU;2-5
Abstract
Materials in use or under consideration for many applications in new a nd emerging technologies are often available only in small quantities and many times in the form of thin films, wafers and sheets. Such size and form limitations present a number of challenges to diose wishing to evaluate thermal performance characteristics. This has resulted in a need to develop totally new transient or modify current transient an d steady state techniques. Various new or modified techniques to measu re the thermal diffusivity, thermal conductivity, specific heat and th ermal expansion over broad temperature ranges will be described. Illus trations of applications to and results on semiconductors, superconduc tors, diamonds, polymers, composites and layered structures will be gi ven and discussed.