TOTAL NORMAL AND SPECTRAL EMITTANCE OF REFRACTORY MATERIALS FOR HIGH-TEMPERATURE OVENS

Authors
Citation
G. Neuer, TOTAL NORMAL AND SPECTRAL EMITTANCE OF REFRACTORY MATERIALS FOR HIGH-TEMPERATURE OVENS, Thermochimica acta, 218, 1993, pp. 211-219
Citations number
4
Categorie Soggetti
Chemistry Analytical
Journal title
ISSN journal
00406031
Volume
218
Year of publication
1993
Pages
211 - 219
Database
ISI
SICI code
0040-6031(1993)218:<211:TNASEO>2.0.ZU;2-3
Abstract
A measurement device based on the radiation comparison technique is de scribed. It enables us to measure the directional total and spectral e mittance between 400-degrees-C and 1200-degrees-C in the wavelength ra nge 0.5 mum to 8 mum and at angles of up to 72-degrees against the nor mal to the surface. Measurements with different types of silica showed that the spectral emittance can be remarkably increased, especially a t wavelengths below 5 mum, by adding small amounts of silicon carbide. This is important for the improvement in the efficiency of the heatin g at different types of furnaces.