THERMAL DIFFUSIVITIES OF THIN DIAMOND FILMS ON SILICON

Photothermal displacement spectroscopy at transient thermal gratings w as used to characterize the thermal diffusivity of diamond films sever al microns thick grown by microwave plasma chemical vapour deposition on silicon substrates. With this very local lateral sensitive method a rather large variation in thermal diffusivities values was obtained, covering the range from 0.2 to 1.7 cm2 s-1. The thermal properties are related to the structural properties investigated by electron microsc ope imaging and Raman spectroscopy.