X-ray and ion projection lithography use membrane-based masks for the
fabrication of microstructures with linewidths below 0.5 mum. To minim
ize pattern distortions during mask fabrication and under operating co
nditions, membranes with a high mechanical stability and defined stres
s are required. Because of its intrinsic properties, diamond should th
erefore be the membrane material of choice. In this paper we demonstra
te that polycrystalline diamond membranes with controlled stress can b
e produced from chemically vapour-deposited diamond films. The results
on properties as well as the compatibility of processing the diamond
films with standard lithography equipment encourage the fabrication of
diamond-based masks for integration in submicron lithography systems.