Four-inch Si wafers were uniformly coated with diamond in a microwave
electron cyclotron resonance (muWECR) process at 2 x 10(-2) mbar gas p
ressure. The thermal filament chemical vapour deposition technique was
employed to pre-coat the wafers only for the optimization of the muWE
CR technique. Special work was necessary to determine the early growth
of diamond. Good-quality coatings can be obtained, allowing patternin
g and boron doping for the fabrication of microsensors, such as thermi
stors, on Si wafers.