M. Shinohara et al., CLEANING OF SI(100) SURFACE BY AS IONIZED CLUSTER BEAM PRIOR TO EPITAXIAL-GROWTH OF GAAS, Journal of applied physics, 73(11), 1993, pp. 7845-7850
It has been found that the exposure of a Si (100) surface to an As ion
ized cluster beam (ICB) is effective in the preparation of the surface
prior to epitaxial growth of GaAs under conventional high vacuum cond
itions of 2 X 10(-5) Pa. This process is achieved at a temperature as
low as 600-degrees-C. A clear 1 X 2 or 2 X 2 reflection high energy el
ectron diffraction pattern observed after the procedure indicates good
ordering of the sample surface. The cleaning process is attributed to
chemical and physical sputtering by As ICB in the first stage and to
the subsequent As termination of Si dangling bonds. It has been found
that the optimum preparation conditions are an accelerating voltage of
the As ionized cluster beam of 1.3 kV and a substrate temperature of
600-degrees-C. GaAs films deposited on As ICB treated Si (100) substra
tes show good crystal quality with single domain structure.