Na. Weir et al., PHOTOREACTIONS OF POLY(O-BUTYRYLSTYRENE) IN THE LONG-WAVE REGION, Journal of photochemistry and photobiology. A, Chemistry, 72(1), 1993, pp. 87-93
Poly(o-butyrylstyrene) (POBS) was exposed in the form of thin films to
long-wave UV radiation (lambda greater-than-or-equal-to 300 nm) under
high vacuum at 25+/-1-degrees-C. Ethylene was the principal low-molec
ular-weight product, but much smaller amounts of CO, methane, ethane a
nd propane were also formed. Quantum yields for gaseous product format
ion were low, indicating that the Norrish type I and II reactions, whi
ch lead to their production, are subject to competition from the relat
ively favourable photoenolization. Transient spectra indicate the pres
ence of the syn- and anti-enols, which have lifetimes of 140 ns and 4.
7 mus respectively. Molecular weight data indicate that crosslinking o
ccurs, but to a much lesser extent than in the isomeric p-acylstyrene
polymers, both the Norrish type II reaction and photoenolization compe
ting with free radical production. Other spectroscopic measurements in
dicate a minimal depletion of the carbonyl concentration, which is con
sistent with the predominance of these reactions. In terms of photodeg
radation, POBS is a relatively photostable polymer.