PHOTOREACTIONS OF POLY(O-BUTYRYLSTYRENE) IN THE LONG-WAVE REGION

Citation
Na. Weir et al., PHOTOREACTIONS OF POLY(O-BUTYRYLSTYRENE) IN THE LONG-WAVE REGION, Journal of photochemistry and photobiology. A, Chemistry, 72(1), 1993, pp. 87-93
Citations number
26
Categorie Soggetti
Chemistry Physical
ISSN journal
10106030
Volume
72
Issue
1
Year of publication
1993
Pages
87 - 93
Database
ISI
SICI code
1010-6030(1993)72:1<87:POPITL>2.0.ZU;2-O
Abstract
Poly(o-butyrylstyrene) (POBS) was exposed in the form of thin films to long-wave UV radiation (lambda greater-than-or-equal-to 300 nm) under high vacuum at 25+/-1-degrees-C. Ethylene was the principal low-molec ular-weight product, but much smaller amounts of CO, methane, ethane a nd propane were also formed. Quantum yields for gaseous product format ion were low, indicating that the Norrish type I and II reactions, whi ch lead to their production, are subject to competition from the relat ively favourable photoenolization. Transient spectra indicate the pres ence of the syn- and anti-enols, which have lifetimes of 140 ns and 4. 7 mus respectively. Molecular weight data indicate that crosslinking o ccurs, but to a much lesser extent than in the isomeric p-acylstyrene polymers, both the Norrish type II reaction and photoenolization compe ting with free radical production. Other spectroscopic measurements in dicate a minimal depletion of the carbonyl concentration, which is con sistent with the predominance of these reactions. In terms of photodeg radation, POBS is a relatively photostable polymer.