R. Wedell et Jp. Kuska, THEORETICAL DESCRIPTION OF SPUTTERING AT GRAZING-INCIDENCE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 78(1-4), 1993, pp. 204-211
The dependence of sputtering yields are calculated on the incidence an
gle for a semi-infinite target. Basic ideas for a more correct descrip
tion of the experimental situation in sputtering at oblique incidence
were developed by Sigmund in 1981. The two correction terms for the sp
uttering yield from a semi-infinite target in comparison with an infin
ite target - the self-sputtering yield and the reflection term - are e
stimated. Whereas the self-sputtering term may be neglected in many ca
ses, the reflection should be taken into account more carefully. Using
an expression for the backscattering angular distribution at glancing
incidence derived by Remizovich et al., the influence of the reflecti
on on the sputtering yield is calculated. The obtained sputtering yiel
d dependence on the incident angle is compared with experiments.