THEORETICAL DESCRIPTION OF SPUTTERING AT GRAZING-INCIDENCE

The dependence of sputtering yields are calculated on the incidence an gle for a semi-infinite target. Basic ideas for a more correct descrip tion of the experimental situation in sputtering at oblique incidence were developed by Sigmund in 1981. The two correction terms for the sp uttering yield from a semi-infinite target in comparison with an infin ite target - the self-sputtering yield and the reflection term - are e stimated. Whereas the self-sputtering term may be neglected in many ca ses, the reflection should be taken into account more carefully. Using an expression for the backscattering angular distribution at glancing incidence derived by Remizovich et al., the influence of the reflecti on on the sputtering yield is calculated. The obtained sputtering yiel d dependence on the incident angle is compared with experiments.