STRUCTURAL CHARACTERIZATION OF A-SIC-H BY THERMAL-DESORPTION SPECTROSCOPY

Authors
MAASS F BERTOMEU J ASENSI JM PUIGDOLLERS J ANDREU J DELGADO JC ESTEVE J
Citation
F. Maass et al., STRUCTURAL CHARACTERIZATION OF A-SIC-H BY THERMAL-DESORPTION SPECTROSCOPY, Applied surface science, 70-1, 1993, pp. 768-771
Citations number
9
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
70-1
Year of publication
1993
Part
B
Pages
768 - 771
Database
ISI
SICI code
0169-4332(1993)70-1:<768:SCOABT>2.0.ZU;2-B
Abstract
The structure of a-Si1-xCx:H thin films prepared from different mixtur es of SiH4 and CH4 was studied by thermal desorption spectroscopy. The influence of the gas phase composition and the thickness on the hydro gen evolution spectra is presented and discussed. A third hydrogen evo lution was observed in a-Si1-xCx films with higher carbon content. The results show that the surface controlled desorption processes become dominant when increasing the carbon content.