Pn. Johnston et al., STUDY OF MOCVD GROWN HG1-XCDXTE BY ION-BEAM TECHNIQUES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 79(1-4), 1993, pp. 490-492
The environment inside a metal organic chemical vapour deposition (MOC
VD) reactor is necessarily rich in carbon and hydrogen, both of which
can be important dopants in semiconductor materials. The current work
focuses on levels of carbon incorporation into thin films and the rela
tionship between carbon concentration and thermodynamic processes. Car
bon levels have been determined using the reaction (C(He,p0)N)-C-12-He
-3-N-14.