A STUDY OF CARBON THIN-FILMS BY ION-BEAMS WITH HIGH-ENERGY RESOLUTION

Authors
Citation
N. Matsunami, A STUDY OF CARBON THIN-FILMS BY ION-BEAMS WITH HIGH-ENERGY RESOLUTION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 79(1-4), 1993, pp. 549-552
Citations number
19
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
79
Issue
1-4
Year of publication
1993
Pages
549 - 552
Database
ISI
SICI code
0168-583X(1993)79:1-4<549:ASOCTB>2.0.ZU;2-H
Abstract
High resolution ion energy loss spectroscopy (HRIELS), conventional Ru therford backscattering spectroscopy (RBS), elastic recoil detection ( ERD) and nuclear reaction analysis (NRA) have been applied to characte rize carbon thin films with a thickness of 6-20 nm prepared by the arc discharge method for the following points: film thickness and its uni formity including pin hole detection; heavy and light impurities; and ion bombardment effects, e.g., enhancement of stopping cross section b y ion bombardment. New information for thin film characterization that can be derived by HRIELS combined with a microbeam is explored.