C. Ascheron, SURFACE HARDENING BY PROTON IRRADIATION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 79(1-4), 1993, pp. 680-686
Ion implantation induced changes in the microhardness of semiconductor
materials are systematically studied in A(III)B(V), A(II)B(VI) and el
emental semiconductors. The influences of different types of radiation
defects and of implanted atoms are separately considered. It is found
that point defects harden material effectively and that the microhard
ness is strongly correlated to the radiation hardness.