A FIELD-IONIZATION MECHANISM FOR A HIGH REFRACTIVE NONLINEARITY IN HEAVILY-DOPED N-GAAS

Citation
F. Agullolopez et Fv. Karpushko, A FIELD-IONIZATION MECHANISM FOR A HIGH REFRACTIVE NONLINEARITY IN HEAVILY-DOPED N-GAAS, Optics communications, 100(1-4), 1993, pp. 181-185
Citations number
14
Categorie Soggetti
Optics
Journal title
ISSN journal
00304018
Volume
100
Issue
1-4
Year of publication
1993
Pages
181 - 185
Database
ISI
SICI code
0030-4018(1993)100:1-4<181:AFMFAH>2.0.ZU;2-Y
Abstract
A new microscopic model is proposed to account for the strong and fast refractive index nonlinearity recently found in heavily doped n-GaAs. The model involves tunneling ionization of the donors induced by the space-charge field generated by the nonhomogeneous light intensity pat tern. In particular, negative refractive index changes DELTAn = -5 x 1 0(3) for excitation pulses of 5 x 10(5) W/cm2 at 885 nm can be reasona bly explained. Response times are estimated to be in the sub-nanosecon d regime (10-100 ps).