INCORPORATION MECHANISM FOR DOPING OF METAL-IONS INTO A PASSIVATING FILM AT THE LITHIUM THIONYL CHLORIDE INTERFACE

Authors
DANILOV VG SHILKIN VI
Citation
Vg. Danilov et Vi. Shilkin, INCORPORATION MECHANISM FOR DOPING OF METAL-IONS INTO A PASSIVATING FILM AT THE LITHIUM THIONYL CHLORIDE INTERFACE, Journal of power sources, 45(1), 1993, pp. 7-13
Citations number
9
Categorie Soggetti
Electrochemistry,"Energy & Fuels
Journal title
Journal of power sources → ACNP
ISSN journal
03787753
Volume
45
Issue
1
Year of publication
1993
Pages
7 - 13
Database
ISI
SICI code
0378-7753(1993)45:1<7:IMFDOM>2.0.ZU;2-D
Abstract
Effects of iron and titanium ions on corrosion processes of lithium in thionyl chloride electrolytes have been studied. Laws for the growth of the passivating film on the type and concentration of doped ions ha ve been established, and equations for these are suggested. A stepwise mechanism of dopant incorporation into passivating film structure is presented.