A new method of measuring the mechanical strength of thin films is des
cribed. We prepare miniature arrays of four tensile specimens, each 0.
25 mm wide, 1 mm long, and 2.2 mum thick, using deposition, patterning
, and etching processes common to the semiconductor industry. Each arr
ay of four specimens is carried on and protected by a rectangular sili
con frame. Thirty-six such specimens are produced on a single wafer. A
fter a specimen frame is mounted, its vertical sides are severed witho
ut damaging the specimens. The load is applied by micrometers through
a special tension spring. Tensile properties of a 2.2 mum thick Ti-Al-
Ti film were determined.