EPITAXIAL DIAMOND THIN-FILMS ON (001) SILICON SUBSTRATES

Authors
JIANG X KLAGES CP ZACHAI R HARTWEG M FUSSER HJ
Citation
X. Jiang et al., EPITAXIAL DIAMOND THIN-FILMS ON (001) SILICON SUBSTRATES, Applied physics letters, 62(26), 1993, pp. 3438-3440
Citations number
8
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
62
Issue
26
Year of publication
1993
Pages
3438 - 3440
Database
ISI
SICI code
0003-6951(1993)62:26<3438:EDTO(S>2.0.ZU;2-S
Abstract
Epitaxial (001) diamond film were grown on mirror-polished single-crys talline (001) silicon substrates by microwave plasma chemical vapor de position from a methane/hydrogen gas mixture. The films were character ized by means of scanning electron microscopy, Raman spectroscopy, and x-ray analysis. The results show that the diamond crystallites are or iented to the silicon substrate with both the (001) planes and the [11 0] directions parallel to the silicon substrate.