Ct. Liang et al., EXPERIMENTAL-EVIDENCE OF A METAL-INSULATOR-TRANSITION IN A HALF-FILLED LANDAU-LEVEL, Solid state communications, 102(4), 1997, pp. 327-330
We have measured the low-temperature transport properties of a high-mo
bility front-gated GaAs/Al0.33Ga0.67As heterostructure. By changing th
e applied gate voltage, we can vary the amount of disorder within the
system. At a Landau level filling factor nu = 1/2, where the system ca
n be described by the composite fermion picture, we observe a crossove
r from metallic to insulating behaviour as the disorder is increased.
Experimental results and theoretical prediction are compared. (C) 1997
Elsevier Science Ltd.