G. Safran et al., THE ROLE OF CHLORINE ADSORPTION IN THE LOW-TEMPERATURE EPITAXIAL-GROWTH OF SILVER, GOLD AND COPPER ON WATER-TREATED NACL, Thin solid films, 229(1), 1993, pp. 37-43
Chlorine adsorbed on either air-cleaved or water-treated NaCl surfaces
prior to metal deposition proved to be active as a surfactant promoti
ng the epitaxial growth of silver, gold and copper at low temperatures
(80-120-degrees-C), while no epitaxial orientation of aluminium layer
s was found under these conditions. Treatment of surfaces of Kyropoulo
s-grown NaCl with bidistilled water resulted in no significant improve
ment in the orientation of vacuum-deposited silver, gold and copper, b
ut after exposing the water-treated surfaces to chlorine gas prior to
evacuation, epitaxial orientation of the vacuum-deposited metals was f
ound. Changes in the nucleation density of the metals and in the cleav
age step structure on NaCl due to different treatments were studied by
surface decoration. A correlation between the presence of active chlo
rine on the NaCl surface and the epitaxial temperature of deposits has
been proposed.