THE MICROSTRUCTURE AND TRIBOLOGY OF MOSX FILMS MODIFIED BY ION-BEAM BOMBARDMENT

Authors
ZHANG XS ZHANG PY LIU HW ZHAO W XU SR
Citation
Xs. Zhang et al., THE MICROSTRUCTURE AND TRIBOLOGY OF MOSX FILMS MODIFIED BY ION-BEAM BOMBARDMENT, Thin solid films, 229(1), 1993, pp. 58-62
Citations number
14
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
229
Issue
1
Year of publication
1993
Pages
58 - 62
Database
ISI
SICI code
0040-6090(1993)229:1<58:TMATOM>2.0.ZU;2-U
Abstract
The present paper reports the structure and tribological studies of Mo S(x) films bombarded with 75 keV Ar+ at a dose of 2.1 x 10(17) Ar+ CM- 2. The results show that it is possible to amorphize MoS(x) crystallin e films and to change the film composition with Ar+ bombardment. After Ar+ bombardment, the sliding wear life of sputter-deposited MoS(x) fi lms increases by a factor of 10, while the friction coefficient increa ses from 0.05 to 0.16. The mechanism of sputter-deposited MoS(x) films modified by ion bombardment is also discussed in this paper.