DETERMINATION OF BULK STATES AND INTERFACE STATES DISTRIBUTIONS IN POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS

Citation
Ca. Dimitriadis et al., DETERMINATION OF BULK STATES AND INTERFACE STATES DISTRIBUTIONS IN POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS, Journal of applied physics, 74(4), 1993, pp. 2919-2919
Citations number
25
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
74
Issue
4
Year of publication
1993
Pages
2919 - 2919
Database
ISI
SICI code
0021-8979(1993)74:4<2919:DOBSAI>2.0.ZU;2-D
Abstract
The field-effect conductance activation energy E(a) as a function of t he gate voltage V(g) is investigated for polycrystalline silicon thin- film transistors. An analytical expression for E(a) is obtained for va rious models of the bulk and interface states. Using a computer minimi zation program to fit the experimental E(a) vs V(g) data with the theo ry, the energy distribution of the bulk states and the interface state s are separated for nonhydrogenated and hydrogenated polycrystalline s ilicon thin-film transistors. In both cases, the bulk states have expo nential band tails and a wide peak near the midgap and the interface s tates have an exponential distribution from the band edge.