PHOTOCONDUCTIVITY MEASUREMENTS OF X-RAY-ABSORPTION FINE-STRUCTURES INLIQUIDS IN THE SOFT-X-RAY REGION - SI AND CL K-EDGE

Photoconductivity measurements of X-ray absorption fine structures (XA FS) at the Si and Cl K-edge have been carried out in a liquid cell for (CH3)4Si, [(CH3)3Si]4Si and CCl4, either as a pure liquid or in a 2,2 ,4- trimethylpentane solution. It is found that for the pure liquids a nd their concentrated hydrocarbon solutions, all K-edge XAFS spectra a re inverted as expected under the condition of total absorption. A sha rp conductivity dip is also observed in CCl4 at the Cl K-edge. The con centration dependence of the XAFS spectrum of CCl4 is reported in some details. These results are discussed in terms of the soft X-ray induc ed ion yields of the solute and solvent molecules in liquids.