IN-HOUSE MEASUREMENTS OF XAFS BY MEANS OF TOTAL-REFLECTION

Citation
K. Tani et al., IN-HOUSE MEASUREMENTS OF XAFS BY MEANS OF TOTAL-REFLECTION, JPN J A P 1, 32, 1993, pp. 270-272
Citations number
7
Categorie Soggetti
Physics, Applied
Volume
32
Year of publication
1993
Supplement
32-2
Pages
270 - 272
Database
ISI
SICI code
Abstract
We have developed a double channel-cut monochromator composed of two c hannel-cut Si(111) crystals, and obtained highly parallel and highly m onochromatized X-ray beam. Reflectivity of an As2Se3 film on an Al sub strate was measured as a function of photon glancing angle around the critical one of total reflection. The complex refractive index was det ermined so that the simulated Fresnel reflectivity fits the measured v alues. Since the imaginary part of the refractive index is correlated with the linear absorption coefficient, we can obtain XAFS spectrum by means of reflectivity measurements in house.