AN OXYGEN K-EDGE NEXAFS STUDY OF H2O ADSORPTION ON SI(111)

Authors
LINDSAY R WINCOTT PL MURYN CA THORNTON G FRIGO SP SIMONS JK ROSENBERG RA
Citation
R. Lindsay et al., AN OXYGEN K-EDGE NEXAFS STUDY OF H2O ADSORPTION ON SI(111), JPN J A P 1, 32, 1993, pp. 347-349
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS → ACNP
Volume
32
Year of publication
1993
Supplement
32-2
Pages
347 - 349
Database
ISI
SICI code
Abstract
The polarisation dependence of the oxygen K-edge Near Edge X-ray Absor ption Fine Structure from Si(111)7x7-OH has been measured using synchr otron radiation. No discernible polarisation dependence is observed. T his is consistent with earlier angle-resolved photoemission data and t he width of the white line in indicating that the Si-OH bond is tilted away from the surface normal.