X-RAY-ABSORPTION FINE-STRUCTURE STUDIES ON AN AMORPHOUS LANI5.0 FILM PREPARED BY REACTIVE SPUTTERING

Citation
H. Sakaguchi et al., X-RAY-ABSORPTION FINE-STRUCTURE STUDIES ON AN AMORPHOUS LANI5.0 FILM PREPARED BY REACTIVE SPUTTERING, JPN J A P 1, 32, 1993, pp. 679-681
Citations number
8
Categorie Soggetti
Physics, Applied
Volume
32
Year of publication
1993
Supplement
32-2
Pages
679 - 681
Database
ISI
SICI code
Abstract
The local structure of amorphous LaNi5.0 films prepared by reactive sp uttering was investigated using XAFS and was compared with that by con ventional sputtering. The interatomic distances and coordination numbe rs of both films coincided. The structural fluctuation was, however, f ound to be smaller for the reactive sputtered film than for the conven tional sputtered film, because small Debye-Waller factors were obtaine d for the reactive sputtered film.