INITIAL-STAGES IN COPPER ELECTROCRYSTALLIZATION ON PLATINUM - THE IMPACT OF THE UNIVALENT COPPER IONS AT LOW OVERVOLTAGES

Citation
Ai. Danilov et al., INITIAL-STAGES IN COPPER ELECTROCRYSTALLIZATION ON PLATINUM - THE IMPACT OF THE UNIVALENT COPPER IONS AT LOW OVERVOLTAGES, Russian journal of electrochemistry, 33(3), 1997, pp. 295-301
Citations number
17
Categorie Soggetti
Electrochemistry
ISSN journal
10231935
Volume
33
Issue
3
Year of publication
1997
Pages
295 - 301
Database
ISI
SICI code
1023-1935(1997)33:3<295:IICEOP>2.0.ZU;2-S
Abstract
The initial stages in copper electrocrystallization at polycrystalline platinum in the 0.5 M H2SO4 + 0.01 M CuSO4 solution are studied at lo w overvoltages by chronoamperometry and cyclic voltammetry with a rota ting ring-disk electrode. The concentration of univalent copper is sho wn to drastically increase in the vicinity of the equilibrium potentia l in the near-electrode region, which creates conditions for depositin g more than a single layer of copper adatoms and forming a microdeposi t with specific characteristics. The microdeposit particles can act as active centers of three-dimensional nucleation at higher cathodic ove rvoltages.