Ai. Danilov et al., INITIAL-STAGES IN COPPER ELECTROCRYSTALLIZATION ON PLATINUM - THE IMPACT OF THE UNIVALENT COPPER IONS AT LOW OVERVOLTAGES, Russian journal of electrochemistry, 33(3), 1997, pp. 295-301
The initial stages in copper electrocrystallization at polycrystalline
platinum in the 0.5 M H2SO4 + 0.01 M CuSO4 solution are studied at lo
w overvoltages by chronoamperometry and cyclic voltammetry with a rota
ting ring-disk electrode. The concentration of univalent copper is sho
wn to drastically increase in the vicinity of the equilibrium potentia
l in the near-electrode region, which creates conditions for depositin
g more than a single layer of copper adatoms and forming a microdeposi
t with specific characteristics. The microdeposit particles can act as
active centers of three-dimensional nucleation at higher cathodic ove
rvoltages.